The intrinsic submicron ZnO thin films prepared by reactive magnetron sputtering

0478348 - FZÚ 2018 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Remeš, Zdeněk - Stuchlík, Jiří - Purkrt, Adam - Chang, Yu-Ying - Jirásek, Vít - Štenclová, Pavla - Prajzler, V. - Nekvindová, P.
The intrinsic submicron ZnO thin films prepared by reactive magnetron sputtering.
NANOCON 2016 8th International Conference on Nanomaterials - Research & Application. Conference proceedings. Ostrava: TANGER Ltd., 2017, s. 36-41. ISBN 978-80-87294-71-0.
[NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./. Brno (CZ), 19.10.2016-21.10.2016]
Grant CEP: GA ČR GC16-10429J
Grant ostatní: AV ČR(CZ) KONNECT-007
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271
Klíčová slova: ZnO * reactive magnetron sputtering * plasma treatment * photothermal deflection spectroscopy * optical spectroscopy
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
https://www.nanocon.eu/cz/sbornik-nanocon-2016/

The DC reactive magnetron sputtering of metallic target in oxide atmosphere is a simple method of depositing the intrinsic (undoped) nanocrystalline layers of metal oxides. We have optimized the deposition of the intrinsic ZnO thin films with submicron thickness 50-500 nm on fused silica glass substrates and investigated the localized defect states below the optical absorption edge down to 0.01 % using photothermal deflection spectroscopy from UV to IR. We have shown that the defect density, the optical absorptance and the related optical attenuation in planar waveguides can be significantly reduced by annealing in air at 400 °C.
Trvalý link: http://hdl.handle.net/11104/0274448