The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil

0390196 - ÚCHP 2013 RIV US eng J - Článek v odborném periodiku
Morozová, Magdalena - Klusoň, Petr - Dzik, P. - Veselý, M. - Baudyš, M. - Krýsa, J. - Šolcová, Olga
The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil.
Journal of Sol-Gel Science and Technology. Roč. 65, č. 3 (2013), s. 452-458. ISSN 0928-0707. E-ISSN 1573-4846
Grant CEP: GA TA ČR TA01020804
Grant ostatní: GA ČR(CZ) GP104/09/P165
Institucionální podpora: RVO:67985858
Klíčová slova: titanium dioxide * photoelectrochemical properties * deposition techniques
Kód oboru RIV: CI - Průmyslová chemie a chemické inženýrství
Impakt faktor: 1.547, rok: 2013

Thin sol-gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as electrochemical cell. The thin TiO2 films were treated at 450° C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV-Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation.
Trvalý link: http://hdl.handle.net/11104/0219712