0605129 - FZÚ 2025 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Vanda, Jan - Mydlář, Martin - Narayanasamy, Priyadarshani - Muresan, Mihai-George - Turčičová, Hana - Pobořil, Radek - Brajer, Jan - Mocek, Tomáš - Vohanka, J. - Dvořák, J.
Comparison of ultra-short pulses laser damage performance of UV AR coatings deposited by e-beam evaporation and magnetron sputtering.
Proceedings of SPIE. Vol. 13190. Bellingham: SPIE, 2024 - (Wren Carr, C.; Ristau, D.), č. článku 1319004. ISBN 978-151068088-3. ISSN 0277-786X.
[Conference of SPIE Laser Damage. San Ramon (US), 07.10.2024-11.10.2024]
Grant CEP: GA MŠMT(CZ) EI22_002/0000677
Institucionální podpora: RVO:68378271
Klíčová slova: laser-induced damage * ultra-short pulse width * UV * optics
Obor OECD: Optics (including laser optics and quantum optics)
DOI: https://doi.org/10.1117/12.3033269

Thin-film layer systems coated by various techniques on the optical component surface are the most common method to finishing laser optics. Anti-reflective thin-film coatings are essential in laser optics to limit unwanted retro-reflections and decrease the reflection-induced losses occurring on boundaries of optical materials and air. Several different technologies are available to prepare laser-quality coatings, when the most common are magnetron sputtering and electron-beam ion-assisted deposition. However, coating materials and deposition parameters may significantly affect both laser resistance and optical quality of the coatings, and the influence of mentioned factors is getting stronger with shorter wavelengths. In following will be disseminated laser damage threshold of anti-reflective coatings prepared by e-beam evaporation with ion assisted deposition and plasma activated reactive magnetron sputtering at wavelength 343 nm in ultra-short pulses regime.
Trvalý link: https://hdl.handle.net/11104/0362969