0600482 - FZÚ 2026 RIV NL eng J - Článek v odborném periodiku
Písaříková, Aneta - Krýsová, Hana - Kapran, Anna - Písařík, Petr - Čada, Martin - Olejníček, Jiří - Hippler, Rainer - Hubička, Zdeněk
Semiconductor WO₃ thin films deposited by pulsed reactive magnetron sputtering.
Materials Science in Semiconductor Processing. Roč. 186, Feb (2025), č. článku 109034. ISSN 1369-8001. E-ISSN 1873-4081
Grant CEP: GA MŠMT(CZ) EH22_008/0004596
Institucionální podpora: RVO:68378271
Klíčová slova: HiPIMS * mid-frequency pulsed magnetron sputtering * photocurrent * plasma diagnostics * RF probe * semiconductor films
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 4.2, rok: 2023 ; AIS: 0.56, rok: 2023
Způsob publikování: Open access
DOI: https://doi.org/10.1016/j.mssp.2024.109034

A pulsed reactive magnetron sputtering system with a tungsten target and a gas mixture of argon and oxygen was investigated as a source for the deposition of semiconductor WO3 thin films on soda lime glass substrates and on the glass with transparent conductive SnO2:F (FTO) electrode.
Trvalý link: https://hdl.handle.net/11104/0357803


Vědecká data: Zenodo