Microstructure and physical properties of black-aluminum antireflective films

0585771 - FZÚ 2025 RIV GB eng J - Článek v odborném periodiku
Correa, Cinthia Antunes - More Chevalier, Joris - Hruška, Petr - Poupon, Morgane - Novotný, Michal - Minárik, P. - Hubík, Pavel - Lukáč, František - Fekete, Ladislav - Prokop, Dejan - Hanuš, J. - Valenta, J. - Fitl, Přemysl - Lančok, Ján
Microstructure and physical properties of black-aluminum antireflective films.
RSC Advances. Roč. 14, May (2024), s. 15220-15231. E-ISSN 2046-2069
Grant CEP: GA ČR GA23-05002S; GA MŠMT LM2023051; GA MŠMT(CZ) EH22_008/0004596
Institucionální podpora: RVO:68378271 ; RVO:61389021
Klíčová slova: thin film * aluminum * antireflective film
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.); Materials engineering (UFP-V)
Impakt faktor: 3.9, rok: 2022
Způsob publikování: Open access

The microstructure and physical properties of reflective and black aluminum were compared for layers of different thicknesses deposited by magnetron sputtering on fused silica substrates. Reflective Al layers followed the Volmer–Weber growth mechanism classically observed for polycrystalline metal films. On the contrary, the extra nitrogen gas used to deposit the black aluminum layers modified the growth mechanism and changed the film morphologies. Nitrogen cumulated in the grain boundaries, favoring the pinning effect and stopping crystallite growth. High defect concentration, especially vacancies, led to strong columnar growth. Properties reported for black aluminum tend to be promising for sensors and emissivity applications.
Trvalý link: https://hdl.handle.net/11104/0353450

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