Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators

0584201 - ÚFP 2024 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Petržílka, Václav - Gajdoš, Pavel - Krůs, Miroslav
Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators.
Proceedings of SPIE - The International Society for Optical Engineering. Bellingham: SPIE, 2023, Roč. 12579 (2023), č. článku 1257905. ISBN 978-151066552-1.
[Laser Acceleration of Electrons, Protons, and Ions VII 2023. Praha (CZ), 25.04.2023-27.04.2023]
Institucionální podpora: RVO:61389021
Klíčová slova: high repetition rate laser accelerators * oblique incidence * Ramp-up injection
Obor OECD: Fluids and plasma physics (including surface physics)
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12579/2660115/Electron-injection-on-steep-ramp-up-plasma-density-profiles-in/10.1117/12.2660115.short

Electron acceleration by laser pulses with high repetition rate can be used for technical applications. To reach conditions for the wake-field laser acceleration, it was demonstrated recently in experiments that it is beneficial to use near single cycle laser drive pulses with sub-4 fs duration, with narrow waists. To explore possible electron density ramp-up injection as an alternative to ramp-down and ionization injections, we performed numerical simulations of electron bunches generation in the ramp-up region. The PIC code Epoch2D and input parameters near to experiments were used. We assumed thin plasma slabs with super Gaussian density profiles of order 4-80, FWHM about 30 μm. We found that density ramp-up injected bunches can have charges several times higher than those obtained by ionization injection. There can be created a group of up to ten bunches in a sequence of bubbles, with not too mutually different maximum energy and charges. At oblique incidence of drive pulses on steep ramp up profiles, we find significant enhancement of the first bunch charge. For large slant angles45 or 45 degrees, the bunch charge enhancement is about twenty times. We conclude that the ramp-up injection can be a useful alternative injection on steep enough density profiles.
Trvalý link: https://hdl.handle.net/11104/0352176