Surface changes induced by Argon plasma treatment of silicon dioxide microparticles

0583494 - FZÚ 2024 RIV SK eng C - Konferenční příspěvek (zahraniční konf.)
Remeš, Zdeněk - Babčenko, Oleg - Ridzoňová, Katarína - Tesárek, P.
Surface changes induced by Argon plasma treatment of silicon dioxide microparticles.
Proceedings of ADEPT - ADEPT 2023. Žilina: University of Žilina, 2023 - (Jandura, D.; Lettrichová, I.; Kováč, jr., J.), s. 47-50. ISBN 978-80-554-1977-0.
[International Conference on Advances in Electronic and Photonic Technologies /11./ - ADEPT 2023. Podbanské (SK), 12.06.2023-15.06.2023]
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA MŠMT(CZ) GA23-05500S
Grant ostatní: AV ČR(CZ) SAV-23-13
Program: Bilaterální spolupráce
Výzkumná infrastruktura: CzechNanoLab II - 90251
Institucionální podpora: RVO:68378271
Klíčová slova: silicon dioxide * inductive coupled plasma * photothermal deflection spectroscopy * photoluminescence spectroscopy
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)

Plasma treatment is a versatile technique for surface treatment at a relatively low temperature. Silicon dioxide microparticles (average size about 1 micrometer) have been treated in an argon plasma using an inductive coupled plasma (ICP) reactor. The modified SiO2 powder was pressed into pellets and characterized by optical absorptance and photoluminescence spectroscopy. Argon bombardment at low pressure increased optical absorption of SiO2 powder as well as blue photoluminescence indicating an increase in defect states on the surface of the microparticles.
Trvalý link: https://hdl.handle.net/11104/0351456