Response of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser

0579468 - ÚFP 2024 RIV US eng J - Článek v odborném periodiku
Medvedev, Nikita - Noei, H. - Toleikis, S. - Ziaja, B.
Response of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser.
Journal of Chemical Physics. Roč. 154, č. 20 (2021), č. článku 204706. ISSN 0021-9606. E-ISSN 1089-7690
Grant CEP: GA MŠMT LTT17015; GA MŠMT(CZ) LM2015083
Grant ostatní: European Cooperation in Science and Technology(BE) CA17126
Program: COST
Institucionální podpora: RVO:61389021
Klíčová slova: XUV * graphene * free-electron laser
Obor OECD: Optics (including laser optics and quantum optics)
Impakt faktor: 4.304, rok: 2021
Způsob publikování: Omezený přístup
https://pubs.aip.org/aip/jcp/article-abstract/154/20/204706/200024/Response-of-free-standing-graphene-monolayer?redirectedFrom=fulltext

The response of a free-standing graphene monolayer exposed to a few tens of femtoseconds long extreme ultraviolet (XUV) pulse was studied theoretically in order to analyze and compare contributions of various mechanisms to the graphene damage, understood here as a global atomic disintegration. Our simulation results indicate that nonthermal disintegration of the atomic structure is the predominant damage mechanism for a free-standing graphene layer. Only at high absorbed doses, charge-induced disintegration of the graphene structure prevails. We also demonstrate that the progressing damage can be probed by femtosecond optical pulses in the soft UV regime (4 eV photon energy). The achieved quantitative understanding of the damage mechanisms may enable a better control of graphene-based devices when they are exposed to x-ray radiation, as well as an efficient processing of graphene layers with ultrashort intense XUV pulses.
Trvalý link: https://hdl.handle.net/11104/0348305