Effects of metal layers on chemical vapor deposition of diamond films

0570909 - FZÚ 2024 RIV CZ eng A - Abstrakt
Izsák, Tibor - Vanko, G. - Babčenko, Oleg - Zaťko, B. - Kromka, Alexander
Effects of metal layers on chemical vapor deposition of diamond films.
NANOCON 2022 - Book of Abstracts. Ostrava: Tanger Ltd, 2022 - (Zbořil, R.; Váňová, J.). s. 68-68. ISBN 978-80-88365-07-5.
[International Conference on Nanomaterials - Research & Application /14./ NANOCON. 19.10.2022-21.10.2022, Brno]
Grant CEP: GA MŠMT LM2018110; GA MŠMT(CZ) LUASK22147
Institucionální podpora: RVO:68378271
Klíčová slova: diamond * CVD * metallization * iridium * Raman * SEM
Obor OECD: Materials engineering

Here, we present the influence of thin metal (Ni, Ir, Au) layers on diamond growth by MWCVD employing two different concepts. In the first concept, a flat substrate (GaN) was initially coated with a thin metal layer, then exposed to the diamond MWCVD process. In the second concept, the thin diamond film was firstly formed, then it was overcoated with the metal layer and finally, once again exposed to the diamond MWCVD. It was confirmed that the Ni films hinder the formation of diamond crystals resulting in the formation of an amorphous carbon layer. Contrary to this finding, the Ir layer resulted in a successful overgrowth by the fully closed diamond film. However, by employing concept 2, the thin Ir layer was found to be unstable and transferred into the isolated clusters, which were overgrown by the diamond film. Using the Au/Ir (30/15 nm) bilayer system stabilized the metallization and no diamond growth was observed on the metal layer.
Trvalý link: https://hdl.handle.net/11104/0342314