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Silicon nanocrystal synthesis with the atmospheric plasma source HelixJet

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    0570403 - FZÚ 2024 RIV DE eng J - Článek v odborném periodiku
    Dworschak, M. - Kohlmann, N. - Matějka, Filip - Galář, Pavel - Kienle, L. - Schäfer, J. - Benedikt, J.
    Silicon nanocrystal synthesis with the atmospheric plasma source HelixJet.
    Plasma Processes and Polymers. Roč. 20, č. 2 (2023), č. článku 2200129. ISSN 1612-8850. E-ISSN 1612-8869
    Institucionální podpora: RVO:68378271
    Klíčová slova: atmospheric pressure plasmas * silane * silicon nanocrystals * photoluminescence
    Obor OECD: Nano-materials (production and properties)
    Impakt faktor: 3.5, rok: 2022
    Způsob publikování: Open access

    The HelixJet, a plasma source operating under atmospheric pressure with RF power, was used for the synthesis of silicon nanoparticles (Si-NPs) in the context of relevance in nanomedicine, sensor technology and nanotechnology. The HelixJet was operated with a variety of He/Ar/H2/SiH4 gas mixtures to characterize the Si-NPs in regards to their size, crystallinity, structure and photoluminescence. Admixture of H2 alongside high RF powers led to the formation of crystalline nanoparticles with a strong photoluminescence intensity, where the photoluminescence properties as well as the nanocrystal synthesis yield were tunable by adjustment of the synthesis parameters. In addition, the experiments conducted in this study resulted in a design improvement of the HelixJet plasma source that extends the stability of the operating range.
    Trvalý link: https://hdl.handle.net/11104/0341712

     
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