Impact of Ge doping on MOVPE grown InGaN layers

0570390 - FZÚ 2024 RIV NL eng J - Článek v odborném periodiku
Hubáček, Tomáš - Kuldová, Karla - Gedeonová, Zuzana - Hájek, František - Košutová, Tereza - Banerjee, Swarnendu - Hubík, Pavel - Pangrác, Jiří - Vaněk, Tomáš - Hospodková, Alice
Impact of Ge doping on MOVPE grown InGaN layers.
Journal of Crystal Growth. Roč. 604, Feb (2023), č. článku 127043. ISSN 0022-0248. E-ISSN 1873-5002
Grant CEP: GA MŠMT LM2018110; GA MŠMT(CZ) LTAIN19163; GA ČR(CZ) GJ20-05497Y
Institucionální podpora: RVO:68378271
Klíčová slova: germanium * MOVPE * InGaN * nitrides * photoluminescence * doping
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 1.8, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.jcrysgro.2022.127043

The impact of Ge doping on InGaN layers grown with the Metal Organic Vapor Phase Epitaxy technique is investigated, with the main focus on the influence of GeH4 flow and Ga/III ratio on the luminescence, electrical and structural properties of InGaN:Ge layers. It is shown that at doping levels above 1019 cm-3 an increase in GeH4 flow results in a decrease in the In content and lower concentration of free carrier density in InGaN layers. On the contrary, the change of Ga/III ratio has no influence on the luminescence and structural properties. An unintentional Ge doping of InGaN layers due to the Ge memory effect or back diffusion is discussed.
Trvalý link: https://hdl.handle.net/11104/0341707