Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response

0570231 - FZÚ 2024 RIV US eng J - Článek v odborném periodiku
Lambert, Nicolas - Sung, Kil-dong - Mortet, Vincent
Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response.
Physica Status Solidi A. Roč. 220, č. 4 (2023), č. článku 2200322. ISSN 1862-6300. E-ISSN 1862-6319
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-03538S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: diamond growth * dynamic gas response * microwave plasma-enhanced chemical vapor deposition (MWPECVD) * optical emission spectroscopy (OES)
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1002/pssa.202200322

Microwave plasma-enhanced chemical vapor deposition (MWPECVD) is widely used for the growth of synthetic doped diamond for electronic and electrochemical applications. Recent results have shown the possible enhancement of phosphorus incorporation using the pulsed gas injection growth method. It is therefore important to understand the dynamics of precursor gases to optimize the dopants incorporation in diamond. In this work, the dynamic response of different gases (N-2, CH4, and O-2) impulses in hydrogen plasma is studied in two different MWPECVD reactors: a lab made NIRIM type reactor, and a commercial reactor made by Seki Diamond Systems. These reactors of different volumes are operated at different pressure and total gas flow. The time responses to the precursor gas injection are recorded by optical emission spectroscopy. Experimental time responses are fitted using an impulse response equation.
Trvalý link: https://hdl.handle.net/11104/0349378