Generation of uniform X-ray illumination and its application to X-ray diffraction microscopy

0568858 - FZÚ 2023 RIV CH eng J - Článek v odborném periodiku
Kunio, K. - Espinoza Herrera, Shirly J. - Khakurel, Krishna
Generation of uniform X-ray illumination and its application to X-ray diffraction microscopy.
Photonics. Roč. 9, č. 12 (2022), č. článku 934. E-ISSN 2304-6732
Grant CEP: GA MŠMT EF16_019/0000789; GA MŠMT EF15_003/0000447; GA MŠMT(CZ) LM2018141
Grant ostatní: OP VVV - ADONIS(XE) CZ.02.1.01/0.0/0.0/16_019/0000789; OP VVV - ELIBIO(XE) CZ.02.1.01/0.0/0.0/15_003/0000447
Institucionální podpora: RVO:68378271
Klíčová slova: X-ray microscopy * flat-top X-ray beams * X-ray free-electron lasers
Obor OECD: Particles and field physics
Impakt faktor: 2.4, rok: 2022
Způsob publikování: Open access

X-ray diffraction microscopy (XDM) is an established lens-less imaging method extensively practiced at synchrotrons and X-ray free-electron lasers (XFELs). XDM is broadly operated in two different modes: scanning and non-scanning. The non-scanning mode of operation in XDM is commonly called coherent diffraction imaging (CDI) and has been the key research direction of many XFEL facilities. This method typically images objects smaller than the size of the illumination, which precludes the imaging of a large group of samples physically larger than the illumination. Furthermore, satisfying this requirement at X-ray free-electron lasers tremendously reduces the volume of practically useful data, leading the experimental scheme to be less efficient. Such a limitation can be circumvented by using a uniform illumination probe rather than the traditional Gaussian-focused probe from the X-ray focusing optics.
Trvalý link: https://hdl.handle.net/11104/0340130