Intensity distribution modulation of multiple beam interference pattern

0567486 - FZÚ 2023 RIV CZ eng J - Článek v odborném periodiku
Jochcová, Dominika - Kaufman, Jan - Hauschwitz, Petr - Brajer, Jan - Vanda, Jan
Intensity distribution modulation of multiple beam interference pattern.
MM Science Journal. Roč. 2019, Dec (2019), s. 3652-3656. ISSN 1803-1269
Grant CEP: GA MŠMT LM2015086; GA MŠMT LO1602
Institucionální podpora: RVO:68378271
Klíčová slova: direct Laser interference patterning * multiple beam interference * interference field simulation * diffractive optical element * laser microstructuring
Obor OECD: Optics (including laser optics and quantum optics)
Způsob publikování: Open access

Nanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography,are considerably slow.In order to reduce processing time,laser patterning methods based on interference of multiple beams have been developed.Within one laser pulse,a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures.Interference patterning goes beyond periodic lines and dots.Controlling the number of interfering beams,orientation of polarization vectors,relative phase shift,the beam angle of incidence allows to customize the intensity distribution on the sample surface.Simulations of various interference patterns were verified on CMOS camera using 1030nm laser diode.Based on these results,dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8ps,11mJ las. pulses at 1030nm.
Trvalý link: https://hdl.handle.net/11104/0338735