Copper tungsten oxide (Cu.sub.x./sub.WO.sub.y./sub.) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

0566773 - FZÚ 2023 RIV US eng J - Článek v odborném periodiku
Hrubantová, Aneta - Hippler, Rainer - Wulff, H. - Čada, Martin - Gedeon, O. - Jiříček, Petr - Houdková, Jana - Olejníček, Jiří - Nepomniashchaia, Natalia - Helm, C.A. - Hubička, Zdeněk
Copper tungsten oxide (Cu_xWO_y) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering.
Journal of Applied Physics. Roč. 132, č. 21 (2022), č. článku 215301. ISSN 0021-8979. E-ISSN 1089-7550
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Výzkumná infrastruktura: CzechNanoLab - 90110
Institucionální podpora: RVO:68378271
Klíčová slova: HiPIMS * sputtering * photoelectrochemical activity * FTO glass * film properties
Obor OECD: Coating and films
Impakt faktor: 3.2, rok: 2022
Způsob publikování: Open access

Copper tungsten oxide films are deposited with the help of reactive high power impulse magnetron sputtering (HiPIMS) in an argon/oxygen gas mixture. Two magnetrons, one equipped with a tungsten target and the other with a copper target, are employed. The HiPIMS discharge is operated with a repetition frequency of f ¼ 100 Hz. Pulse widths of 100 and 20 μs separated by 25 μs are chosen for the tungsten and copper target, respectively. Films deposited on two different glass substrates [soda lime glass and fluorine doped tin oxide (FTO) coated glass] are characterized by energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectroscopy, and ellipsometry. Photoelectrochemical activity was investigated by linear voltammetry. Annealed films deposited on FTO glass are composed of WO3 and CuWO4 or Cu2WO4 crystal phases.
Trvalý link: https://hdl.handle.net/11104/0338068