Possible approaches for combined use of xenon and gallium ion sources for task specific focused ion beam sample preparation

0566515 - FZÚ 2023 RIV US eng A - Abstrakt
Klimša, Ladislav - Duchoň, Jan - Svora, Petr - Kopeček, Jaromír
Possible approaches for combined use of xenon and gallium ion sources for task specific focused ion beam sample preparation.
Microscopy and Microanalysis. Cambridge University Press. Roč. 28, č. 1 (2022), s. 26-27. ISSN 1431-9276. E-ISSN 1435-8115.
[Microscopy & Microanalysis 2022. 31.07.2022-04.08.2022, Portland]
Grant CEP: GA MŠMT LM2018110
Institucionální podpora: RVO:68378271
Klíčová slova: FIB-SEM * plasma FIB-SEM
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)

Gallium (Ga) is the most commonly used liquid metal ion source (LMIS) for commercial focused ion beam (FIB) instruments, and in terms of scanning electron microscopy (SEM), is also the most commonly used ion column in platform instruments called “dual-beams” (FIB-SEM). Although there are a few reasons why it is advantageous to use this type of source, e.g., Ga low melting point, long source life, high angular intensity with a small energy spread, etc., there are also disadvantages, which FIB users should avoid. One of those problems, often present in transmission electron microscopy (TEM) sample preparation (FIB-SEM prepared TEM lamellae), is implantation of Ga ions in the specimen. A few years ago, “dual-beams” with plasma source focused ion beam (PFIB-SEM) were introduced, preferably using noble gas Xenon (Xe) ions. Here, we would like to demonstrate various possible approaches for combined use of these powerful platform instruments.
Trvalý link: https://hdl.handle.net/11104/0337838