Tailoring pulsed laser deposition fabricated copper oxide film by controlling plasma parameters

0566220 - FZÚ 2024 RIV NL eng J - Článek v odborném periodiku
Volfová, Lenka - Irimiciuc, Stefan - Chertopalov, Sergii - Hruška, Petr - Čízek, J. - Vondráček, Martin - Novotný, Michal - Butterling, M. - Liedke, M.O. - Wagner, A. - Lančok, Ján
Tailoring pulsed laser deposition fabricated copper oxide film by controlling plasma parameters.
Applied Surface Science. Roč. 608, Jan (2023), č. článku 155128. ISSN 0169-4332. E-ISSN 1873-5584
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA MŠMT LM2018110
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR LQ100102001
Program: Prémie Lumina quaeruntur
Institucionální podpora: RVO:68378271
Klíčová slova: pulsed laser deposition * copper oxide * defects * in situ plasma monitoring
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 6.7, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.apsusc.2022.155128

The role of oxygen pressure on the structural and physical properties of various copper oxide phases, grown by Pulsed Laser Deposition (PLD) on MgO (100), has been investigated over the pressure range of 1⋅10–5 Pa–1 Pa. Positron annihilation spectroscopy revealed positrons trapped at vacancies and large vacancy clusters with lifetimes ranging from 400 ps to 500 ps. Single copper vacancies VCu, interesting for p-type applications, were found in the CuO phase, whereas in the Cu2O phase copper vacancy complexes coupled with oxygen vacancies (VCu + VO and VCu + 2VO) were seen. Suitable O2 atmosphere conditions, which induced a mixture of copper oxide phases with CuO crystals growing on top of Cu2O films were found.The deposition process was monitored with in situ diagnostic techniques based on Optical Emission Spectroscopy and Langmuir Probe, and enabled identification of kinetic energy ranges for Cu ions, which promote the formation of CuO or Cu2O phases.
Trvalý link: https://hdl.handle.net/11104/0341771