Investigations on the CuI thin films production by pulsed laser deposition

0562426 - FZÚ 2023 RIV NL eng J - Článek v odborném periodiku
Irimiciuc, Stefan - Chertopalov, Sergii - Buryi, Maksym - Remeš, Zdeněk - Vondráček, Martin - Fekete, Ladislav - Novotný, Michal - Lančok, Ján
Investigations on the CuI thin films production by pulsed laser deposition.
Applied Surface Science. Roč. 606, Dec (2022), č. článku 154868. ISSN 0169-4332. E-ISSN 1873-5584
Grant CEP: GA ČR(CZ) GA20-21069S; GA MŠMT(CZ) EF16_019/0000760
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: Copper iodine thin film * pulsed laser deposition * Langmuir probe * vacancies control
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 6.7, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.apsusc.2022.154868

CuI thin films were deposited by pulsed laser deposition (PLD) in various Ar atmospheres. Control over the morphology, structure and defect nature of the deposited films was attempted by in-situ plasma diagnostics. The deposited films presented stoichiometric crystallinity on the full range of experimental condition with no residual oxidation, as per XRD and XPS measurements. Band gap tailoring was achieved by controlling the plasma ion kinetic energy with optimum conditions being defined by Cu and I ionic groups with kinetic energies surpassing 200 eV. Variation in Ar pressure allowed control over the nature of vacancies from VI + Cui to predominantly VCu. In situ plasma measurements revealed that the addition of Ar leads to the preferentially scattering of the Cu ions in the plasma which subsequently leads Cu ions energy losses.
Trvalý link: https://hdl.handle.net/11104/0334744