Growth of carbon allotropes in plasma CVD system

0559036 - FZÚ 2023 RIV SK eng C - Konferenční příspěvek (zahraniční konf.)
Kromka, Alexander - Babčenko, Oleg - Izsák, Tibor - Varga, Marián - Vanko, G. - Zehetner, J. - Potocký, Štěpán
Growth of carbon allotropes in plasma CVD system.
Proceedings of ADEPT - ADEPT 2022. Žilina: University of Žilina, 2022 - (Feiler, M.; Ziman, M.; Kováčová, S.; Kováč, jr., J.), s. 17-20. ISBN 978-80-554-1884-1.
[10th International Conference on Advances in Electronic and Photonic Technologies - ADEPT 2022. Tatranská Lomnica (SK), 20.06.2022-24.06.2022]
Grant CEP: GA MŠMT(CZ) 8X20035; GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: diamond * carbon allotropes * carbon nanotubes * dual plasma
Obor OECD: Materials engineering

Various carbon (nano-) forms, so-called allotropes, have become one of the most supporting activities in fundamental and applied research trends. Therefore, a universal deposition process capable of “adjusting” system parameters in one “deposition chamber” is highly demanding. Here, we present a low-pressure large area deposition system combining radiofrequency (RF) and microwave (MW) plasma in one chamber in different configurations, which offers a wide deposition window for the growth of sp2 carbon (carbon nanotubes, amorphous carbon), a mixture of sp2 and sp3 (diamond-like films) and pure sp3 carbon represented by diamond films. We will show that not only the type of plasma source (RF vs. MW) but also the gas mixture and plasma chemistry are crucial parameters for the controllable and reproducible growth of these allotropes at temperatures from 250 to 800 °C.
Trvalý link: https://hdl.handle.net/11104/0332451