Effect of pulsed methane gas flow on the incorporation of phosphorous in diamond

0556046 - FZÚ 2023 RIV CH eng J - Článek v odborném periodiku
Mortet, Vincent - Taylor, Andrew - Davydova, Marina - Lamač, Marcel - Lambert, Nicolas - Elantyev, I. - Lorinčík, J. - Troadec, D. - Vronka, Marek - Potocký, Štěpán
Effect of pulsed methane gas flow on the incorporation of phosphorous in diamond.
Diamond and Related Materials. Roč. 124, April (2022), č. článku 108928. ISSN 0925-9635. E-ISSN 1879-0062
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-03538S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Výzkumná infrastruktura: CzechNanoLab - 90110
Institucionální podpora: RVO:68378271
Klíčová slova: diamond * phosphorus doping * optical emission spectroscopy * PECVD
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 4.1, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.diamond.2022.108928

The synthesis of n-type phosphorus-doped diamond is essential for the development of diamond-based bipolar devices. Although demonstrated 20 years ago, it remains a complex problem due to low incorporation efficiency and low maximum concentrations. Previous works showed the deleterious influence of methinophosphide formation in a methane/hydrogen/phosphine plasma on the growth of phosphorous doped diamond using the chemical vapor deposition method. In this work, we investigate the effect of pulsing methane during microwave plasma enhanced chemical vapor deposition to avoid the formation of HCP and to increase phosphorus incorporation efficiency and maximum concentration in diamond.
Trvalý link: http://hdl.handle.net/11104/0330422