Tailoring pulsed laser deposition of phosphorus doped WO.sub.x./sub. films from (PO.sub.2./sub.).sub.4./sub.(WO.sub.3./sub.).sub.4./sub. target by space-resolved optical emission spectroscopy

0555884 - FZÚ 2023 RIV CH eng J - Článek v odborném periodiku
More Chevalier, Joris - Irimiciuc, Stefan - Volfová, Lenka - Fekete, Ladislav - Chertopalov, Sergii - Poupon, Morgane - Duverger-Nédellec, E. - Hervé, L. - Novotný, Michal - Pérez, O. - Lančok, Ján
Tailoring pulsed laser deposition of phosphorus doped WO_x films from (PO₂)₄(WO₃)₄ target by space-resolved optical emission spectroscopy.
Thin Solid Films. Roč. 742, Jan (2022), č. článku 139042. ISSN 0040-6090. E-ISSN 1879-2731
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA18-17834S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: plasma investigation * phophosrus doped tungsten oxide * pulsed laser deposition * thin films
Obor OECD: Coating and films
Impakt faktor: 2.1, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.tsf.2021.139042

Phosphorus doped WOx films were deposited on fused silica substrates from a target of monophosphate tungsten bronze (PO2)4(WO3)2 m with m = 2. Different conditions of O2 pressures and substrate temperature depositions were performed in parallel to plasma investigations during the depositions step. Changes were observed in the film stoichiometries affecting the film properties while the increase of the O2 pressure. Optical bandgap was shifted from 3.39 eV to 3.86 eV as a function of the deposition pressure from 7.5 Pa to 20 Pa. In situ optical emission spectroscopy was carried out in all the O2 atmosphere conditions.
Trvalý link: http://hdl.handle.net/11104/0330347