Methods of the electron induced cleanning in SEM

0551132 - ÚPT 2022 RIV US eng A - Abstrakt
Müllerová, Ilona - Konvalina, Ivo - Materna Mikmeková, Eliška
Methods of the electron induced cleanning in SEM.
Microscopy and Microanalysis. Cambridge University Press. Roč. 27, S1 (2021), s. 2016-2017. ISSN 1431-9276. E-ISSN 1435-8115
Institucionální podpora: RVO:68081731
Klíčová slova: SEM * contamination * electron beam cleaning * graphene
Obor OECD: Electrical and electronic engineering
https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/methods-of-the-electron-induced-cleanning-in-sem/54D0340450B8B0BEA7DAD306BCE1C21B

A special technique was developed and tested to clean the specimen and to do the imaging of the individual graphene layers, or other 2D materials, in the standard vacuum conditions of the conventional SEM. Parameters such as the primary electron beam energy, electron dose, sample bias, and scanning rate have been optimized to find the equilibrium between electron stimulated desorption (cleaning) and deposition (contamination).
Trvalý link: http://hdl.handle.net/11104/0326577