Thermal stability of Ti/Ni multilayer thin films

0549491 - ÚPT 2022 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Václavík, R. - Zábranský, L. - Souček, P. - Sťahel, P. - Buršík, Jiří - Fořt, Tomáš - Buršíková, V.
Thermal stability of Ti/Ni multilayer thin films.
978-80-87294-98-7. In: NANOCON 2020. 12th International Conference on Nanomaterials - Research & Application. Conference proceedings. Ostrava: TANGER, 2021, s. 518-523. ISBN 978-80-87294-98-7. ISSN 2694-930X.
[International Conference on Nanomaterials - Research & Application /12./. Brno (CZ), 21.10.2020-23.10.2020]
Grant CEP: GA ČR(CZ) GA20-11321S
Institucionální podpora: RVO:68081731 ; RVO:68081723
Klíčová slova: Ti/Ni * multilayers * magnetron sputtering * nanoindentation * annealing
Obor OECD: Nano-materials (production and properties); Nano-materials (production and properties) (UFM-A)
https://www.confer.cz/nanocon/2020/3776-mechanical-properties-of-multilayers-characterised-using-advanced-methods

In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100-800 degrees C.
Trvalý link: http://hdl.handle.net/11104/0325484