Damage kinetics induced by swift heavy ion impacts onto films of different thicknesses

0545325 - FZÚ 2022 RIV NL eng J - Článek v odborném periodiku
Rymzhanov, R.A. - Medvedev, Nikita - Volkov, A.E.
Damage kinetics induced by swift heavy ion impacts onto films of different thicknesses.
Applied Surface Science. Roč. 566, Nov (2021), č. článku 150640. ISSN 0169-4332. E-ISSN 1873-5584
Grant CEP: GA MŠMT LTT17015
GRANT EU: European Commission(XE) 654148 - LASERLAB-EUROPE
Institucionální podpora: RVO:68378271
Klíčová slova: electronic excitation * thin film * surface damage * swift heavy ion * electron emission * nanocluster emission
Obor OECD: Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)
Impakt faktor: 7.392, rok: 2021
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.apsusc.2021.150640

Response of CaF2 thin films to swift heavy ions irradiation is studied with Monte-Carlo code TREKIS and mo lecular dynamics simulations. Two factors affecting the damage kinetics in ion tracks in films of different thickness are considered: electron emission and an effect of the layer thickness. It is shown that escape of electrons from the target surface is important in films thinner than 15 nm and can significantly reduce energy deposited into the lattice. Three different modes of damage realize depending on the layer thickness: a through hole forms in the thinnest layers despite energy loss via electron emission, semispherical and spherical hillocks form at intermediate thicknesses, emission of nanoclusters occurs from thick layers.
Trvalý link: http://hdl.handle.net/11104/0322048