Patterning of conductive nano-layers on garnet

0543745 - ÚPT 2022 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Chlumská, Jana - Lalinský, Ondřej - Matějka, Milan - Krátký, Stanislav - Kolařík, Vladimír
Patterning of conductive nano-layers on garnet.
NANOCON 2020. 12th International Conference on Nanomaterials - Research & Application. Conference proceedings. Ostrava: TANGER, 2021, (2021), s. 221-224. ISBN 978-80-87294-98-7. ISSN 2694-930X.
[International Conference NANOCON 2020 /12./. Brno (CZ), 21.10.2020-23.10.2020]
Grant CEP: GA TA ČR(CZ) TN01000008
Institucionální podpora: RVO:68081731
Klíčová slova: Electron beam lithography * nano-patterning * yttrium aluminium garnet
Obor OECD: Nano-processes (applications on nano-scale)
https://www.confer.cz/nanocon/2020/3731-patterning-of-conductive-nano-layer-on-garnet

Synthetic crystalline materials of the garnet group are used as scintillators in scanning electron microscopy. If a thick conductive layer is applied on the garnet surface, slower electrons don't have enough energy to pass through this relatively thick conductive layer on the scintillator surface. Therefore, either thinner conductive layer or appropriate patterning of the thicker layer has to be used. Within this contribution we study the patterning process of such conductive nano-layer. Resolution of the patterning process is of high interest. Two approaches are compared: direct writing electron beam lithography and mask projection UV lithography.
Trvalý link: http://hdl.handle.net/11104/0320902