Analysis of thickness-dependent electron transport in magnetron sputtered ZrN films by spectroscopic ellipsometry

0543140 - FZÚ 2022 RIV CH eng J - Článek v odborném periodiku
Bulíř, Jiří - More Chevalier, Joris - Chertopalov, Sergii - Fekete, Ladislav - Volfová, Lenka - Hubík, Pavel - Novotný, Michal - Lančok, Ján
Analysis of thickness-dependent electron transport in magnetron sputtered ZrN films by spectroscopic ellipsometry.
Thin Solid Films. Roč. 731, Aug (2021), č. článku 138746. ISSN 0040-6090. E-ISSN 1879-2731
Grant CEP: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA ČR GA17-05770S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: magnetron sputtering * spectroscopic ellipsometry * zirconium nitride
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 2.358, rok: 2021
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.tsf.2021.138746

In this work, we deal with a study of the electron-transport behavior of zirconium nitride RF magnetron sputtered films using Zr target in reactive nitrogen ambient. The films were grown on silica-coated silicon substrates at a substrate temperature of 300◦C. The growth process was monitored using an in-situ spectral ellipsometer in a spectral range from 245 to 1690 nm. The ellipsometric data were analyzed using a dispersion model based on Drude-Lorentz oscillators. We estimated electron-transport properties at each stage of the deposition process by analysis of the model parameters.

Trvalý link: http://hdl.handle.net/11104/0320422