Growth and properties of diamond films prepared on 4-inch substrates by cavity plasma systems

0542446 - FZÚ 2022 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Babčenko, Oleg - Potocký, Štěpán - Aubrechtová Dragounová, Kateřina - Szabó, Ondrej - Bergonzo, P. - Rezek, B. - Kromka, Alexander
Growth and properties of diamond films prepared on 4-inch substrates by cavity plasma systems.
Proceedings 12th International Conference on Nanomaterials - Research & Application - Nanocon 2020. Ostrava: Tanger Ltd., 2021, s. 86-92. ISBN 978-80-87294-98-7. ISSN 2694-930X.
[International Conference NANOCON 2020 /12./. Brno (CZ), 21.10.2020-23.10.2020]
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA MŠMT LM2018110
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: large area diamond * microwave cavity plasma * high-power density plasma
Obor OECD: Coating and films

We compare two microwave (2.45 GHz) plasma systems with ellipsoidal and multimode clamshell cavity for diamond synthesis by chemical vapor deposition. We use H2/CH4/CO2 gas mixture for diamond film deposition on Si 100 wafers. Both systems are capable of high pressure (up to 20 kPa) operation and high growth rates (several µm/h). We compare the cavity systems from the point of diamond quality (Raman shift measurement), substrate size (2” versus 4”) and grown film homogeneity together with surface morphology (SEM), deposition rate and parasitic doping levels (photoluminescence).
Trvalý link: http://hdl.handle.net/11104/0319855