Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties

0539267 - ÚFCH JH 2022 RIV DE eng J - Článek v odborném periodiku
Krýsová, Hana - Neumann-Spallart, M. - Tarábková, Hana - Janda, Pavel - Kavan, Ladislav - Krýsa, J.
Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties.
Beilstein Journal of Nanotechnology. Roč. 12, JAN 2021 (2021), s. 24-34. ISSN 2190-4286. E-ISSN 2190-4286
Grant CEP: GA ČR(CZ) GA20-11635S; GA MŠMT(CZ) LM2018124
Institucionální podpora: RVO:61388955
Klíčová slova: Al2O3 * atomic layer deposition * corrosion
Obor OECD: Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)
Impakt faktor: 3.272, rok: 2021
Způsob publikování: Open access

Al2O3 layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO2/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. However, these films were rapidly dissolved in 1 M NaOH (≈100 nm/h). The dissolution was slower in 1 M H2SO4 (1 nm/h) but after 24 h the blocking behaviour was entirely lost. The optimal stability was reached at pH 7.2 where no changes were found up to 24 h and even after 168 h of exposure the changes in the blocking behaviour were still minimal. This behaviour was also observed for protection against direct reduction of FTO.
Trvalý link: http://hdl.handle.net/11104/0316945