Study of Li diffusion in thin film of Re annealed at high temperatures

0525012 - ÚJF 2021 RIV GB eng J - Článek v odborném periodiku
Cannavó, Antonino - Vacík, Jiří - Hnatowicz, Vladimír - Ceccio, Giovanni - Horák, Pavel - Lavrentiev, Vasyl - Koster, U. - Pasold, G.
Study of Li diffusion in thin film of Re annealed at high temperatures.
Journal of Instrumentation. Roč. 15, č. 5 (2020), č. článku P05010. ISSN 1748-0221. E-ISSN 1748-0221
Grant CEP: GA MŠMT LM2015056
Grant ostatní: AV ČR(CZ) MSM100481902
Program: Program na podporu mezinárodní spolupráce začínajících výzkumných pracovníků
Institucionální podpora: RVO:61389005
Klíčová slova: Inspection with neutrons * Instrumentation for radioactive beams * fragmentation devices * fragment and isotope, separators incl. ISOL * isobar separators * ion and atom traps * weak-beam diagnostics * radioactive-beam ion sources * Interaction of radiation with matter
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 1.415, rok: 2020
Způsob publikování: Omezený přístup
https://doi.org/10.1088/1748-0221/15/05/P05010

Depth profiles of Li-6 implanted into high-melting point rhenium refractory metal has been measured for as-implanted, as well as thermally annealed samples using a non-destructive Thermal Neutron Depth Profiling technique at the LWR-15 research reactor in Rez. The Gaussianlike shape, typical for as-implanted Li-depth profile, is preserved after the thermal annealing at high temperature demonstrating the activation of the Li atom diffusion process at the Re-target. The diffusion coefficient at 1830 degrees C has been evaluated by the comparison of the Li profiles before and after the thermal annealing. This study aims to investigate the applicability of Re metal in ISOL related applications.
Trvalý link: http://hdl.handle.net/11104/0309216