Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon

0520838 - FZÚ 2020 RIV US eng J - Článek v odborném periodiku
Humlíček, J. - Kuldová, Karla - Krumpolec, R. - Cameron, D.C.
Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon.
Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics. Roč. 37, č. 5 (2019), s. 1-6, č. článku 051206. ISSN 2166-2746. E-ISSN 2166-2754
Institucionální podpora: RVO:68378271
Klíčová slova: vapour deposition * copper chloride * characterization * ellipsometry * optical properties
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 1.511, rok: 2019
Způsob publikování: Omezený přístup
https://doi.org/10.1116/1.5121240

Sequential pulsed vapor deposition was used to prepare thin films of copper(I) chloride (CuCl) on silicon. The films are nanocrystalline and show a very strong ultraviolet luminescence. The excitonic response and corresponding luminescent properties make these films promising for new short-wavelength photonic/photoelectronic devices.
Trvalý link: http://hdl.handle.net/11104/0305496