Ion Beam Sputtering for Controlled Synthesis of Thin MAX (MXene) Phases

0517818 - ÚJF 2020 RIV US eng A - Abstrakt
Horák, Pavel - Vacík, Jiří - Bakardjieva, Snejana - Cannavó, Antonino - Ceccio, Giovanni - Kupčík, Jaroslav - Klie, R.
Ion Beam Sputtering for Controlled Synthesis of Thin MAX (MXene) Phases.
Microscopy and Microanalysis. Cambridge University Press. Roč. 25, S2 (2019), s. 1626-1627. ISSN 1431-9276. E-ISSN 1435-8115.
[Microscopy & Microanalysis 2019 Meeting. 04.08.2019-08.08.2019, Portland]
Grant CEP: GA MŠMT LM2015056; GA MŠMT(CZ) LTAUSA17128
Institucionální podpora: RVO:61388980 ; RVO:61389005
Klíčová slova: ion beam sputtering * LEIF
Obor OECD: Nuclear physics; Inorganic and nuclear chemistry (UACH-T)

In the CANAM research infrastructure of the NPI in Rez, a new system (LEIF – Low Energy Ion Facility) has been recently assembled utilizing a new-type of a multi-CUSP ion source. It can produce ions in a broad, tunable energy range 100 eV - 35 keV with a high current up to 500 uA. This system was adapted to employ an IBS technique, and it is also used for ion irradiation/implantation (in an implantation chamber) with high fluences up to 1020 cm-2 . In the process of ion beam sputtering, the targets are mounted on a cooled Cu holder,. In the case of a multiphase composite synthesis, the target holder acquires a multi-angle form that is revolving according the required stoichiometric ratio and sputtering/deposition rates of the phases. For promotion of the phase synthesis, the substrates are fixed on a heated platform and kept at elevated temperatures.
Trvalý link: http://hdl.handle.net/11104/0303077