Functional nano–structuring of thin silicon nitride membranes

0512017 - ÚPT 2020 CZ eng A - Abstrakt
Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
Functional nano–structuring of thin silicon nitride membranes.
5th IMAPS Flash Conference. Book of Abstracts. Brno: University of Technology, 2019. s. 74-75.
[International Microelectronics Assembly and Packaging Society Flash Conference /5./. IMAPS. 24.10.2019-25.10.2019, Brno]
Institucionální podpora: RVO:68081731
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika

The silicon nitride (SiN) films are typically used in semiconductor industry as a dielectric or masking layer. SiN films are commonly used as well as a base material for membrane fabrication that can be used in various microelectronic and micro optic devices (MEMS, MOMS). While the basic procedure of membrane fabrication is well described, what brings new technological challenges is the micro– and nanopatterning of its surface. Such membranes with surface modifications can have both new functionality and possible applications, e.g. modify electromagnetic radiation or charged particle beams distribution, phase or spectrum.
Trvalý link: http://hdl.handle.net/11104/0302234