On Utilizing Plasma to Produce Barrier Coatings on Cold Fieldemission Cathodes

0512002 - ÚPT 2020 CZ eng A - Abstrakt
Burda, Daniel - Knápek, Alexandr - Kolařík, Vladimír
On Utilizing Plasma to Produce Barrier Coatings on Cold Fieldemission Cathodes.
5th IMAPS Flash Conference. Book of Abstracts. Brno: University of Technology, 2019. s. 52-53.
[International Microelectronics Assembly and Packaging Society Flash Conference /5./. IMAPS. 24.10.2019-25.10.2019, Brno]
Institucionální podpora: RVO:68081731
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika

The availability of bright and robust electron sources plays significant role in pushing the boundaries towards the various state-of-the-art imaging and analysis and X-Ray techniques in materials science, e.g. SEM, TEM, STEM, X-Ray tomography. In conventional electron microscope systems, Tungsten/Zirconium Oxide (W/ZrO) Schottky emission cathodes have become the primary field-emission sources, this
may be due to longer lifetime a lower vacuum requirement than the cold field emission cathodes [1]. However, for the highest resolution TEM, STEM, the cold field emission cathodes are needed [2].
Despite the broad range of materials, which field-emission properties have been studied to date, incl. semiconductors [3], metals and metalloids, the tungsten remains the material of choice for cold field cathodes [2], mainly for its relatively low price and
robustness. The energy diagram of cathode without the barrier coating is in Fig.1. The cold field cathodes may be coated with a dielectric barrier layer, whose purposeb is primarily to lower the work function of the surface, and secondarily toprotect the tip against degradation and blunting by ion bombardment.
Trvalý link: http://hdl.handle.net/11104/0302227