Photo-electrochemical properties of WO.sub.3./sub. and alpha-Fe.sub.2./sub.O.sub.3./sub. thin films

0510813 - FZÚ 2020 RIV IT eng J - Článek v odborném periodiku
Krysa, J. - Zlámal, M. - Kment, Štěpán - Hubička, Zdeněk
Photo-electrochemical properties of WO₃ and alpha-Fe₂O₃ thin films.
Chemical Engineering Transactions. Chemical Engineering Transactions. Roč. 41, SI (2014), s. 379-384. ISSN 1974-9791
Grant CEP: GA ČR GAP108/12/2104
Institucionální podpora: RVO:68378271
Klíčová slova: sputtering * HiPIMS * thin films
Obor OECD: Fluids and plasma physics (including surface physics)
Způsob publikování: Open access

Iron oxide (α-Fe2O3) in hematite crystalline structure and tungsten trioxide have recently attracted much attention as possibly convenient materials to be used for hydrogen production via photoelectrochemical water splitting. Thius is due to their favorable properties such as band gaps between 2.0 - 2.2 eV (α-Fe2O3) and 2.5–2.8 eV (WO3) which allows absorbing of a substantial fraction of solar spectrum.
Trvalý link: http://hdl.handle.net/11104/0301192