0510688 - FZÚ 2020 RIV GB eng C - Konferenční příspěvek (zahraniční konf.)
Ohashi, H. - Higashiguchi, T. - Suzuki, Y. - Kawasaki, M. - Suzuki, C. - Tomita, K. - Nishikino, M. - Fujioka, S. - Endo, Akira - Li, B. - Otsuka, T. - Dunne, P. - O'Sullivan, G.
Characteristics of extreme ultraviolet emission from high-Z plasmas.
Journal of Physics: Conference series. Vol. 688. Bristol: IOP Publishing Ltd., 2016, s. 1-4, č. článku 012079. ISSN 1742-6588.
[International Conference on Inertial Fusion Sciences and Applications (IFSA) /8./. Nara (JP), 08.09.2013-13.09.2013]
Grant ostatní: AV ČR(CZ) VP17
Institucionální podpora: RVO:68378271
Klíčová slova: extreme ultraviolet (EUV) lithography * soft x-ray sources
Obor OECD: Optics (including laser optics and quantum optics)
DOI: https://doi.org/10.1088/1742-6596/688/1/012079

We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.
Trvalý link: http://hdl.handle.net/11104/0301101