0507477 - ÚMCH 2020 RIV DE eng J - Článek v odborném periodiku
Knotek, P. - Plecháček, T. - Smolík, J. - Kutálek, P. - Dvořák, F. - Vlček, Milan - Navrátil, J. - Drašar, Č.
Kelvin probe force microscopy of the nanoscale electrical surface potential barrier of metal/semiconductor interfaces in ambient atmosphere.
Beilstein Journal of Nanotechnology. Roč. 10, 15 July (2019), s. 1401-1411. ISSN 2190-4286. E-ISSN 2190-4286
Grant CEP: GA ČR(CZ) GA16-07711S
Institucionální podpora: RVO:61389013
Klíčová slova: Kelvin probe atomic force microscope * nanoinclusion * Schottky barrier
Obor OECD: Inorganic and nuclear chemistry
Impakt faktor: 2.612, rok: 2019
Způsob publikování: Open access
https://www.beilstein-journals.org/bjnano/content/pdf/2190-4286-10-138.pdf

This study deals with the preparation and characterization of metallic nanoinclusions on the surface of semiconducting Bi2Se3 that could be used for an enhancement of the efficiency of thermoelectric materials. We used Au forming a 1D alloy through diffusion (point nanoinclusion) and Mo forming thermodynamically stable layered MoSe2 nanosheets through the reaction with the Bi2Se3. The Schottky barrier formed by the 1D and 2D nanoinclusions was characterized by means of atomic force microscopy (AFM). We used Kelvin probe force microscopy (KPFM) in ambient atmosphere at the nanoscale and compared the results to those of ultraviolet photoelectron spectroscopy (UPS) in UHV at the macroscale. The existence of the Schottky barrier was demonstrated at +120 meV for the Mo layer and −80 meV for the Au layer reflecting the formation of MoSe2 and Au/Bi2Se3 alloy, respectively. The results of both methods (KPFM and UPS) were in good agreement. We revealed that long-time exposure (tens of seconds) to the electrical field leads to deep oxidation and the formation of perturbations greater than 1 µm in height, which hinder the I–V measurements.
Trvalý link: http://hdl.handle.net/11104/0298458