Influence of GaN buffer layer under InGaN/GaN MQWs on luminescent properties

0505794 - FZÚ 2020 RIV NL eng J - Článek v odborném periodiku
Dominec, Filip - Hospodková, Alice - Hubáček, Tomáš - Zíková, Markéta - Pangrác, Jiří - Kuldová, Karla - Vetushka, Aliaksi - Hulicius, Eduard
Influence of GaN buffer layer under InGaN/GaN MQWs on luminescent properties.
Journal of Crystal Growth. Roč. 507, Feb (2019), s. 246-250. ISSN 0022-0248. E-ISSN 1873-5002
Grant CEP: GA MŠMT(CZ) LO1603; GA ČR GA16-15569S
GRANT EU: European Commission(XE) 690599 - ASCIMAT
Institucionální podpora: RVO:68378271
Klíčová slova: low dimensional structures * V-pits * metalorganic vapor phase epitaxy * InGaN/GaN quantum wells * GaN buffer layer * scintillators
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 1.632, rok: 2019
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.jcrysgro.2018.11.025

Although InGaN layers or InGaN/GaN superlattices are commonly used as efficiency improving buffers for LED structure production, there is still a controversy and active discussion about the mechanisms improving the luminescence properties of InGaN QWs grown above such buffers. In this manuscript it is shown that presence of In in the buffer layer is not the primary reason for photoluminescence improvement which can be also achieved by introduction of GaN buffer layer grown at lower temperature under nitrogen atmosphere. SIMS analysis suggests that low temperature buffer layer does not influence the impurity incorporation and hence the PL improvement is caused by suppressed contamination of MQW region grown above the low temperature buffer. AFM images for two samples that differ mostly in morphology however supports another explanation in which formation of larger V-pits is the main reason for the luminescence improvement.
Trvalý link: http://hdl.handle.net/11104/0297183