Photolitography on flexible substrates

0500532 - ÚPT 2019 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Urbánek, M. - Urbánek, P. - Kuřitka, I. - Kolařík, Vladimír
Photolitography on flexible substrates.
9th International conference on nanomaterrials - research & application (NANOCON 2017). Proceedings. Ostrava: TANGER, 2018, s. 914-917. ISBN 978-80-87294-81-9.
[International Conference on Nanomaterials - Research and Application (NANOCON) /9./. Brno (CZ), 18.10.2017-20.10.2017]
Institucionální podpora: RVO:68081731
Klíčová slova: photolithography * flexible substrates * metal layer
Obor OECD: Materials engineering

Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates.
Trvalý link: http://hdl.handle.net/11104/0292609