Modeling of XUV-induced damage in Ru films: the role of model parameters

0500189 - ÚFP 2019 RIV US eng J - Článek v odborném periodiku
Milov, I. - Lipp, V. - Medvedev, Nikita - Makhotkin, I.A. - Louis, E. - Bijkerk, F.
Modeling of XUV-induced damage in Ru films: the role of model parameters.
Journal of the Optical Society of America. B. Roč. 35, č. 10 (2018), B43-B53. ISSN 0740-3224. E-ISSN 1520-8540
Grant CEP: GA MŠMT LTT17015; GA MŠMT(CZ) LM2015083
Institucionální podpora: RVO:61389021
Klíčová slova: faser damage * free-electron lasers * X-rays * soft x-rays * extreme ultraviolet (EUV) * metals * thin film
Obor OECD: Optics (including laser optics and quantum optics)
Impakt faktor: 2.284, rok: 2018
http://bib-pubdb1.desy.de/record/410525/files/josab-35-10-B43.pdf

We perform a computational study of damage formation in extreme ultraviolet (XUV)-irradiated ruthenium thin films by means of combining the Monte Carlo approach with the two-temperature model. The model predicts that the damage formation is most affected by ultrafast heating of the lattice by hot electrons, and is not very sensitive to the initial stage of the material excitation. Numerical parameters of the model were analyzed, as well as different approximations for the thermal parameters, showing the importance of the temperature dependence of the electron thermal conductivity and the electron-phonon coupling factor. Our analysis reveals that the details of photoabsorption and ultrafast non-equilibrium electron kinetics play only a minor role in the XUV irradiation regime.
Trvalý link: http://hdl.handle.net/11104/0292306