Počet záznamů: 1
Chemical depth profile of layered a-CSiO:H nanocomposites
- 1.0499570 - FZÚ 2019 RIV NL eng J - Článek v odborném periodiku
Houdková, Jana - Branecky, M. - Plichta, T. - Jiříček, Petr - Zemek, Josef - Cech, V.
Chemical depth profile of layered a-CSiO:H nanocomposites.
Applied Surface Science. Roč. 456, Oct (2018), s. 941-950. ISSN 0169-4332. E-ISSN 1873-5584
Grant CEP: GA MŠMT EF16_013/0001406; GA MŠMT(CZ) LM2015088
Grant ostatní: OP VVV - SAFMAT(XE) CZ.02.1.01/0.0/0.0/16_013/0001406
Institucionální podpora: RVO:68378271
Klíčová slova: XPS depth pro filing * rgon gas cluster ion beam * layered nanocomposite * Young's modulus * plasma-enhanced chemical vapor deposition
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 5.155, rok: 2018
Layered nanocomposites with a controlled distribution of mechanical properties across the nanostructures were analyzed by XPS depth profiling using argon gas cluster ion beams.
Trvalý link: http://hdl.handle.net/11104/0291762
Počet záznamů: 1