Structural and optical properties of luminescent copper(I) chloride thin films deposited by sequentially pulsed chemical vapour deposition

0497910 - FZÚ 2019 RIV CH eng J - Článek v odborném periodiku
Krumpolec, R. - Homola, T. - Cameron, D.C. - Humlíček, J. - Caha, O. - Kuldová, Karla - Zazpe, R. - Přikryl, J. - Macák, J. M.
Structural and optical properties of luminescent copper(I) chloride thin films deposited by sequentially pulsed chemical vapour deposition.
Coatings. Roč. 8, č. 10 (2018), s. 1-16, č. článku 369. E-ISSN 2079-6412
Institucionální podpora: RVO:68378271
Klíčová slova: vapour deposition * copper chloride * characterization * optical properties * XPS * crystal structure
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 2.330, rok: 2018

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.
Trvalý link: http://hdl.handle.net/11104/0290377