Enhanced diamond nucleation via photoresist polymers combined with nanodiamond seeding layers

0496872 - FZÚ 2019 CZ eng A - Abstrakt
Szabó, Ondrej - Ižák, Tibor - Potocký, Štěpán - Kromka, Alexander
Enhanced diamond nucleation via photoresist polymers combined with nanodiamond seeding layers.
NANOCON 2017 - Book of Abstracts. Ostrava: Tanger Ltd, 2017 - (Shrbená, J.). s. 89-90. ISBN 978-80-87294-78-9.
[NANOCON 2017. International Conference on Nanomaterials - Research & Application /9./. 18.10.2017-20.10.2017, Brno]
Grant CEP: GA ČR(CZ) GA17-19968S; GA MŠMT 7AMB17AT036
Institucionální podpora: RVO:68378271
Klíčová slova: diamond film * nucleation * polymers * Raman * SEM
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)

Here we studied the influence of two different photoresist polymers (S1802 and ma1215 spin-coated at thicknesses 100 nm and 1.5 m, respectively) and their multi-layered combinations with nanodiamond seeding layer(s) on the nucleation and growth of diamond thin films. Before the diamond CVD growth the atomically flat (100) silicon substrates were treated in different ways employing i) only nanodiamond seeding layer (NL), ii) only photoresist layer (PL), iii) nanodiamond/photoresist layer (NL/PL) and other layer combinations: iv) PL/NL, v) NL/PL/NL, vi) PL/NL/PL. All the samples were loaded to the microwave CVD system to grow the diamond thin films at low temperature (300 °C) in H2/CH4/CO2 gas mixture for 3 and 9 hours. The film morphology and its quality were evaluated by scanning electron microscopy and Raman measurements.
Trvalý link: http://hdl.handle.net/11104/0289492