Preparation of ppHMDSO Thin Films in Capacitively Coupled RF Glow Discharges under Dusty Plasma Conditions

0495573 - ÚJF 2019 CZ eng C - Konferenční příspěvek (zahraniční konf.)
Homola, V. - Buršíková, V. - Kelar, L. - Kelarová, Š. - Stupavska, M. - Peřina, Vratislav
Preparation of ppHMDSO Thin Films in Capacitively Coupled RF Glow Discharges under Dusty Plasma Conditions.
NANOCON 2017: Conference Proceedings. Ostrava: Tanger Ltd., 2018, s. 831-835. ISBN 978-80-87294-81-9.
[9th International Conference on Nanomaterials - Research and Application (NANOCON 2017). Brno (CZ), 18.10.2017-20.10.2017]
Grant CEP: GA MŠMT LM2015056
Institucionální podpora: RVO:61389005
Klíčová slova: Hexamethyldisiloxane * mechanical properties * oxygen * PECVD
Obor OECD: Nano-materials (production and properties)

The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films
Trvalý link: http://hdl.handle.net/11104/0288520