Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges

0489659 - FZÚ 2019 RIV CH eng J - Článek v odborném periodiku
Straňák, V. - Bogdanowicz, R. - Sezemsky, P. - Wulff, H. - Kruth, A. - Smietana, M. - Kratochvíl, J. - Čada, Martin - Hubička, Zdeněk
Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges.
Surface and Coatings Technology. Roč. 335, Feb (2018), s. 126-133. ISSN 0257-8972
Institucionální podpora: RVO:68378271
Klíčová slova: film properties * HiPIMS * ITO * plasma deposition
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 3.192, rok: 2018

The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N-2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties is attributed to change of crystalline structure measured by XRD methods.
Trvalý link: http://hdl.handle.net/11104/0284031