Enhanced oxidation of TiO.sub.2./sub. films prepared by high power impulse magnetron sputtering running in metallic mode

0486984 - FZÚ 2018 RIV US eng J - Článek v odborném periodiku
Straňák, V. - Kratochvíl, J. - Olejníček, Jiří - Kšírová, Petra - Sezemsky, P. - Čada, Martin - Hubička, Zdeněk
Enhanced oxidation of TiO₂ films prepared by high power impulse magnetron sputtering running in metallic mode.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-9, č. článku 171914. ISSN 0021-8979. E-ISSN 1089-7550
Grant CEP: GA ČR(CZ) GA15-00863S
Institucionální podpora: RVO:68378271
Klíčová slova: sputter deposition * plasma deposition * gas discharges * metallic thin films * probe plasma diagnostics
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2.176, rok: 2017

A method is introduced that allows suppressing unwanted effects of target poisoning during reactive high-power impulse magnetron sputtering (R-HiPIMS) employed for deposition of oxide films. The method, based on higher reactivity of excited/activated oxygen species, is studied and demonstrated on TiO2 films deposited in R-HiPIMS discharge running very close to the metallic mode with a high deposition rate. An external source of energetic plasma that activates oxygen gas, delivered to the vicinity of the substrate, is combined with conventional R-HiPIMS of the Ti target. The activated oxygen species enable reducing the total flow rate, which simultaneously results in suppression of the target poisoning effect. On the other hand, sufficient oxidation and growth of transparent crystalline TiO2 films were observed.
Trvalý link: http://hdl.handle.net/11104/0281690