Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O.sub.2./sub. mixtures

0486980 - FZÚ 2018 RIV US eng J - Článek v odborném periodiku
Čada, Martin - Lundin, D. - Hubička, Zdeněk
Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O₂ mixtures.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-7, č. článku 171913. ISSN 0021-8979. E-ISSN 1089-7550
Grant CEP: GA ČR(CZ) GA15-00863S
GRANT EU: European Commission(XE) 608800 - HIPPOCAMP
Institucionální podpora: RVO:68378271
Klíčová slova: reactive sputtering * HiPIMS * Langmuir probe * R-IRM model * plasma density * electron temperature
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2.176, rok: 2017

A reactive high-power impulse magnetron sputtering (HiPIMS) process using a titanium target in a mixture of Ar/O2 has been investigated for different modes of operation including pure argon, metallic, transition, and compound mode. The trends and changes in the plasma density ne and the effective electron temperature Teff, have been measured by the time-resolved Langmuir probe technique. The same experimental process conditions have also been studied using a recently developed reactive ionization region model (R-IRM), making it possible to compare the acquired experimental results with the model results. It was found that trends in the plasma density and mean electron energy as measured by the Langmuir probe are in good agreement with the results obtained from the R-IRM model for different pulse discharge current densities.
Trvalý link: http://hdl.handle.net/11104/0281686