Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO.sub.2./sub. layers

0486979 - FZÚ 2018 RIV US eng J - Článek v odborném periodiku
Hippler, R. - Hubička, Zdeněk - Čada, Martin - Kšírová, Petra - Wulff, H. - Helm, C.A. - Straňák, V.
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO₂ layers.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-9, č. článku 171906. ISSN 0021-8979. E-ISSN 1089-7550
Grant CEP: GA ČR(CZ) GA15-00863S
Institucionální podpora: RVO:68378271
Klíčová slova: HiPIMS * Langmuir probe * titanium dioxide * angular dependence * XRD * SEM
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2.176, rok: 2017

Angular distribution measurements have been carried out during High Power Impulse Magnetron Sputtering (HiPIMS) of a titanium target and deposition of titanium and titanium oxide films. The HiPIMS system was operated at a repetition frequency f = 100 Hz with a duty cycle of 1%. Langmuir probe diagnostics has been carried out at a distance of 7.5 cm from the target at four different angles with respect to the surface normal of the target. Film properties were investigated by means of SEM, XR, and GIXD, and a dependence of film thickness and crystalline structure on the deposition angle is observed. Published by AIP Publishing.
Trvalý link: http://hdl.handle.net/11104/0281685