Silver catalysed nanoscale silicon etching in water vapour

0484819 - FZÚ 2018 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Křížek, Filip - Pikna, Peter - Fejfar, Antonín
Silver catalysed nanoscale silicon etching in water vapour.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014, s. 21-24. ISBN 978-80-87294-55-0.
[NANOCON International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
Grant CEP: GA ČR GA13-25747S; GA ČR GA13-12386S; GA MŠMT(CZ) LM2011026
Institucionální podpora: RVO:68378271
Klíčová slova: silicon etching * water vapour * silver nanoparticles * thermal annealing
Obor OECD: Nano-materials (production and properties)

N+-doped silicon substrates were etched by water vapour under the silver nanoparticles acting as a catalyst. Thin silver layer was deposited on two silicon wafers, where one of them was thermally annealed in nitrogen to create silver nanoparticles. Subsequently, both samples were annealed in water vapour and afterwards analysed by Scanning Electron Microscope. The images have shown that the annealed silver nanoparticles burrowed into the silicon substrate in the case of both samples. This new method of silicon etching introduces an alternative way of manufacturing nanohole arrays in silicon substrates.

Trvalý link: http://hdl.handle.net/11104/0279955