ZnO thin films prepared by reactive magnetron sputtering

0480529 - FZÚ 2018 eng A - Abstrakt
Remeš, Zdeněk - Stuchlík, Jiří - Purkrt, Adam - Chang, Yu-Ying - Jirásek, Vít - Prajzler, V. - Štenclová, Pavla - Nekvindová, P.
ZnO thin films prepared by reactive magnetron sputtering.
NANOCON 2016. List of Abstracts. Ostrava: Tanger Ltd., 2016 - (Shrbená, J.). s. 33-33. ISBN 978-80-87294-68-0.
[NANOCON 2016. International Conference /8./. 19.10.2016-21.10.2016, Brno]
Grant CEP: GA ČR GC16-10429J
Grant ostatní: AV ČR(CZ) KONNECT-007
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271
Klíčová slova: ZnO * reactive magnetron sputtering * plasma treatment * PDS * optical spectroscopy
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)

DC reactive magnetron sputtering of metallic target in oxide atmosphere is a simple method of depositing the nominally undoped (intrinsic) polycrystalline layers of metal oxides. We have optimized the deposition of ZnO thin films on fused silica substrates and investigated the localized defect states below the optical absorption edge using photothermal deflection spectroscopy (PDS) that allows to measure the optical absorption down to 0,01% in a broad spectral range from UV to near IR. We have shown that the defect density and thus the electrical resistivity as well as the optical transparency can be significantly increased by annealing in air at 400C and reduced by the hydrogen plasma.
Trvalý link: http://hdl.handle.net/11104/0276299