Mass spectrometry investigation of magnetron sputtering discharges

0477676 - FZÚ 2018 RIV GB eng J - Článek v odborném periodiku
Pokorný, Petr - Musil, Jindřich - Lančok, Ján - Fitl, Přemysl - Novotný, Michal - Bulíř, Jiří - Vlček, Jan
Mass spectrometry investigation of magnetron sputtering discharges.
Vacuum. Roč. 143, č. 6 (2017), s. 438-443. ISSN 0042-207X. E-ISSN 1879-2715
Grant CEP: GA MŠMT LO1409; GA MŠMT LM2015088; GA TA ČR(CZ) TA03010490; GA ČR GA17-13427S
Institucionální podpora: RVO:68378271
Klíčová slova: mass spectrometry * atoms * radicals and ions * RF discharge * contamination * metallic films
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 2.067, rok: 2017

This paper deals with the mass spectrometric characterization of atoms, radicals and ions generated in the RF magnetron discharges sputtering metal targets in Ne, Ar, Kr and Xe gases. In magnetron discharges different kinds of species such as atoms, radicals and positive and negative ions according to the target material and sputtering gas pressure can be generated. The mass spectrometry of the magnetron discharge, which gives the detailed information on these species, is of key importance for the development of new advanced thin films. The amount of individual atoms, radicals and ions and the ion energy distribution as a function of flow and pressure of the sputtering gas, and the magnetron power is discussed in detail.
Trvalý link: http://hdl.handle.net/11104/0273958